Title :
Multicharged boron ions produced from pure elements and oxide compounds vaporized in electron cyclotron resonance source
Author :
Kato, Y. ; Ishii, S.
Author_Institution :
Dept. of Electron. & Inf., Toyama Prefectural Univ., Japan
Abstract :
Summary form only given. Multicharged boron ions have been produced by vaporizing the powder of boron or boron oxide compounds in a 2.45-GHz electron cyclotron resonance (ECR) ion source. A vapor source is boron-nitride crucible with a tantalum heater and radiation shields, and set in an ECR plasma along the geometrical axis of the mirror field which octupole magnetic field is superimposed on using permanent magnets. The opening of the crucible faces an ellipsoidal ECR zone formed at the bottom of the magnetic mirror trap. According to measurements with Tungsten Rhenium thermocouples, the temperature in the crucible is able to reach about 1700/spl deg/C. The vapor pressure of boron covers the range of the experimental pressure (10/sup -4-3/ Pa) with the crucible temperature of about 1500/spl deg/C.
Keywords :
boron; cyclotron resonance; discharges (electric); ion sources; plasma applications; positive ions; B; B/sub 2/O/sub 3/; B/sup 2+/; B/sup 3+/; ECR ion source; ECR plasma; W-Re; W-Rh thermocouples; crucible opening; crucible temperature; electron cyclotron resonance source; ellipsoidal ECR zone; geometrical axis; magnetic mirror trap; mirror field; multicharged B ions; octupole magnetic field; oxide compounds; permanent magnets; pure elements; radiation shields; tantalum heater; vapor pressure; vapor source; Boron; Cyclotrons; Electrons; Magnetic field measurement; Magnetic resonance; Magnetic shielding; Mirrors; Plasma measurements; Plasma temperature; Powders;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677797
