DocumentCode :
1643276
Title :
Coulomb oscillations in 100 nm and 50 nm CMOS devices
Author :
Specht, M. ; Sanquer, M. ; Caillat, C. ; Guegan, G. ; Deleonibus, S.
Author_Institution :
CEA, Centre d´Etudes Nucleaires de Grenoble, France
fYear :
1999
Firstpage :
383
Lastpage :
385
Abstract :
We investigate Coulomb oscillations at very low temperature in CMOS devices with nominal gate lengths of 100 nm and 50 nm and various widths. When the source drain conductance becomes smaller than the quantum e/sup 2//h, transport is dominated by resonant tunnelling through a single quantum dot formed by an impurity potential. Downscaling the channel length reduces the typical size of the impurity quantum dot pushing up the charging energy to at least several tens of Kelvin.
Keywords :
Coulomb blockade; MOSFET; resonant tunnelling; semiconductor quantum dots; 100 nm; 50 nm; CMOS device; Coulomb oscillation; impurity quantum dot; resonant tunnelling; Electrons; Geometry; Implants; Impurities; MOSFETs; Quantum dots; Resonant tunneling devices; Silicon; Temperature; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-5410-9
Type :
conf
DOI :
10.1109/IEDM.1999.824175
Filename :
824175
Link To Document :
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