DocumentCode
1643748
Title
Toward scientific manufacturing
Author
Tsujide, T.
Author_Institution
Device Anal. Technol. Labs., Kawasaki, Japan
fYear
1999
Firstpage
471
Lastpage
474
Abstract
This paper first describes two newly developed in-line electrical/physical defect inspection methods, then reviews the technologies we have developed so far which involve in-situ particle monitoring methods in etching/deposition chambers, a logic LSI testing method and computational failure analysis methods for memory/logic LSIs, and finally proposes a concept to achieve scientific manufacturing with these technologies.
Keywords
failure analysis; inspection; integrated circuit manufacture; integrated circuit testing; large scale integration; process monitoring; computational failure analysis; deposition chamber; etching chamber; in-line defect inspection; in-situ particle monitoring; logic LSI; logic LSI testing; memory LSI; scientific manufacturing; Acceleration; Etching; Failure analysis; Inspection; Large scale integration; Logic testing; Manufacturing; Optical filters; Physics computing; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location
Washington, DC, USA
Print_ISBN
0-7803-5410-9
Type
conf
DOI
10.1109/IEDM.1999.824195
Filename
824195
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