DocumentCode
1643929
Title
Thermal analysis on a two chip TSS
Author
Gerousis, Vassilios ; Fang, Tze-Ting ; Xue, JinTao ; Garg, Lalit ; Li, Tao
Author_Institution
Cadence Design Syst., Inc., San Jose, CA, USA
fYear
2009
Firstpage
290
Lastpage
294
Abstract
3D ICs is a new technology for achieving high density, low power and cost effective designs. As a result of dies being stacked over each other, TSS (Through Silicon tsv Stack) poses a challenge of heat flow and temperature management. A die level thermal analysis tool which can analyze a stacked die configuration, modeling boundary conditions, TSVs and fit into existing SoC design flows is the need of hour for 3D IC designers. In this paper, a thermal tool of Cadence which meets the requirement exactly is introduced. We present a flow for 3D thermal analysis of a two chip TSS (Through Silicon tsv Stack) design and also present the results of experiments done to validate the flow. Special acknowledge to Mark Nakamoto, Radojcic Riko and Bai Cher at Qualcomm.
Keywords
elemental semiconductors; logic design; low-power electronics; silicon; system-on-chip; thermal analysis; three-dimensional integrated circuits; 3D integrated circuits designs; 3D thermal analysis; Bai Cher; Cadence; Mark Nakamoto; Qualcomm; Radojcic Riko; SoC design; die level thermal analysis tool; dies stacking; heat flow; temperature management; through silicon tsv stack; two chip TSS; Analytical models; Heat sinks; Integrated circuit modeling; Integrated circuit technology; Performance analysis; Silicon; Temperature; Thermal loading; Three-dimensional integrated circuits; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
SoC Design Conference (ISOCC), 2009 International
Conference_Location
Busan
Print_ISBN
978-1-4244-5034-3
Electronic_ISBN
978-1-4244-5035-0
Type
conf
DOI
10.1109/SOCDC.2009.5423794
Filename
5423794
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