• DocumentCode
    1643929
  • Title

    Thermal analysis on a two chip TSS

  • Author

    Gerousis, Vassilios ; Fang, Tze-Ting ; Xue, JinTao ; Garg, Lalit ; Li, Tao

  • Author_Institution
    Cadence Design Syst., Inc., San Jose, CA, USA
  • fYear
    2009
  • Firstpage
    290
  • Lastpage
    294
  • Abstract
    3D ICs is a new technology for achieving high density, low power and cost effective designs. As a result of dies being stacked over each other, TSS (Through Silicon tsv Stack) poses a challenge of heat flow and temperature management. A die level thermal analysis tool which can analyze a stacked die configuration, modeling boundary conditions, TSVs and fit into existing SoC design flows is the need of hour for 3D IC designers. In this paper, a thermal tool of Cadence which meets the requirement exactly is introduced. We present a flow for 3D thermal analysis of a two chip TSS (Through Silicon tsv Stack) design and also present the results of experiments done to validate the flow. Special acknowledge to Mark Nakamoto, Radojcic Riko and Bai Cher at Qualcomm.
  • Keywords
    elemental semiconductors; logic design; low-power electronics; silicon; system-on-chip; thermal analysis; three-dimensional integrated circuits; 3D integrated circuits designs; 3D thermal analysis; Bai Cher; Cadence; Mark Nakamoto; Qualcomm; Radojcic Riko; SoC design; die level thermal analysis tool; dies stacking; heat flow; temperature management; through silicon tsv stack; two chip TSS; Analytical models; Heat sinks; Integrated circuit modeling; Integrated circuit technology; Performance analysis; Silicon; Temperature; Thermal loading; Three-dimensional integrated circuits; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SoC Design Conference (ISOCC), 2009 International
  • Conference_Location
    Busan
  • Print_ISBN
    978-1-4244-5034-3
  • Electronic_ISBN
    978-1-4244-5035-0
  • Type

    conf

  • DOI
    10.1109/SOCDC.2009.5423794
  • Filename
    5423794