DocumentCode
1644207
Title
Performance limits of silicon MOSFET´s
Author
Assad, F. ; Zhibin Ren ; Datta, S. ; Lundstrom, M. ; Bendix, P.
Author_Institution
Purdue Univ., West Lafayette, IN, USA
fYear
1999
Firstpage
547
Lastpage
550
Abstract
A procedure for comparing the current vs. voltage characteristics of MOSFETs against their upper limits is described, and a 0.35 /spl mu/m n-MOS technology is assessed. Channel back-scattering coefficients for this technology are deduced where we show that the on-current performance is /spl sim/45% of its upper limit. We also show that conventional device scaling maintains approximately the same level of device performance, and we discuss the implications for the ITRS on-current performance targets. Finally, we compare the upper limit performance of a p-channel vs. an n-channel MOSFET technology.
Keywords
MOSFET; elemental semiconductors; silicon; 0.35 micron; Si; channel backscattering coefficient; current-voltage characteristics; device scaling; n-channel technology; p-channel technology; silicon MOSFET; CMOS technology; Doping profiles; Electrical resistance measurement; Equations; Large scale integration; Logic; MOSFET circuits; Semiconductor process modeling; Silicon; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location
Washington, DC, USA
Print_ISBN
0-7803-5410-9
Type
conf
DOI
10.1109/IEDM.1999.824213
Filename
824213
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