Title :
A new super-junction VDMOS realizing fast reverse recovery
Author :
Bo Yi ; Xinjiang Lyu ; Xingbi Chen
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
In this paper, the authors propose a new Super-Junction VDMOS structure to realize fast reverse recovery of its body diode. In the proposed SJ-VDMOS, the P-pillar of the drift region is surrounded by a thin SiO2 which prevents the injection of electrons from both the drain and the N-pillar region into the P-pillar region. Thus the stored charges are reduced. A diode D0 integrated outside the edge terminal is used to conduct the electrons collected at the interface of the bottom polysilicon/SiO2 generated during the turning-off state of the VDMOS to prevent pre-breakdown. Besides, a Schottky diode in parallel with the body diode is also integrated to further reduce the reverse recovery charges (Qrr). Simulation results show that the proposed SJ-VDMOS obtains the lowest Qrr = 54 nC without any lifetime control which reduces the total switching power loss in an invertor system to about 48 μJ for a 500 V SJ-VDMOS @ I = 1.6 A.
Keywords :
MOSFET; Schottky diodes; silicon compounds; N-pillar region; P-pillar region; Schottky diode; SiO2; body diode; current 1.6 A; drift region; energy 48 muJ; fast reverse recovery; invertor system; polysilicon; super-junction VDMOS; switching power loss; vertical diffused metal oxide semiconductor; voltage 500 V; Charge carrier lifetime; Leakage currents; MOSFET; Power dissipation; Radiation effects; Schottky diodes; Switches;
Conference_Titel :
Power Electronics and Drive Systems (PEDS), 2015 IEEE 11th International Conference on
Conference_Location :
Sydney, NSW
DOI :
10.1109/PEDS.2015.7203553