Title :
Particle reduction through the control of triboelectric charges
Author :
Ypsilanti, Bill ; Sanden, Bernie
Author_Institution :
Motorola Inc., Mesa, AZ, USA
Abstract :
This study demonstrates the effectiveness of using ion generators to control triboelectric charges as a means of reducing the number of particles that adhere to wafers during the manufacturing process. This study was instituted in a mature wafer fab in order to achieve some level of particle reduction in a short time without the expense and engineering effort associated with minienvironments
Keywords :
semiconductor technology; ion generators; particle reduction; semiconductor manufacturing; triboelectric charge control; wafer fab; wafer surface; Cleaning; Costs; Geometry; Manufacturing industries; Manufacturing processes; Personnel; Pulse measurements; Resists; Semiconductor device manufacture; Surface charging;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-2053-0
DOI :
10.1109/ASMC.1994.588205
