• DocumentCode
    1645492
  • Title

    Monolithic high-Q overhang inductors fabricated on silicon and glass substrates

  • Author

    Jun-Bo Yoon ; Chui-Hi Han ; Euisik Yoon ; Choong-Ki Kim

  • Author_Institution
    Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
  • fYear
    1999
  • Firstpage
    753
  • Lastpage
    756
  • Abstract
    We have investigated the RF performance of the micromachined integrated spiral inductors overhanging several tens of microns from the substrate, having at least 10 /spl mu/m in copper thickness. From the experiments, it can be speculated that once the inductor is overhung by at least 30 /spl mu/m, the substrate coupling can be eliminated almost completely, even in the standard silicon substrate, as long as there is no additional support. The inductor overhanging 30 /spl mu/m from the standard silicon substrate has shown an inductance of 1.8 nH with the unprecedented peak Q-factor of 50 at 7 GHz.
  • Keywords
    MMIC; Q-factor; inductance; inductors; micromachining; 7 GHz; MMIC; Si; inductance; micromachined integrated spiral inductors; monolithic high-Q overhang inductors; peak Q-factor; substrate coupling; Air gaps; Copper; Fabrication; Glass; Inductance; Inductors; Q factor; Radio frequency; Silicon; Spirals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
  • Conference_Location
    Washington, DC, USA
  • Print_ISBN
    0-7803-5410-9
  • Type

    conf

  • DOI
    10.1109/IEDM.1999.824260
  • Filename
    824260