DocumentCode
1645492
Title
Monolithic high-Q overhang inductors fabricated on silicon and glass substrates
Author
Jun-Bo Yoon ; Chui-Hi Han ; Euisik Yoon ; Choong-Ki Kim
Author_Institution
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
fYear
1999
Firstpage
753
Lastpage
756
Abstract
We have investigated the RF performance of the micromachined integrated spiral inductors overhanging several tens of microns from the substrate, having at least 10 /spl mu/m in copper thickness. From the experiments, it can be speculated that once the inductor is overhung by at least 30 /spl mu/m, the substrate coupling can be eliminated almost completely, even in the standard silicon substrate, as long as there is no additional support. The inductor overhanging 30 /spl mu/m from the standard silicon substrate has shown an inductance of 1.8 nH with the unprecedented peak Q-factor of 50 at 7 GHz.
Keywords
MMIC; Q-factor; inductance; inductors; micromachining; 7 GHz; MMIC; Si; inductance; micromachined integrated spiral inductors; monolithic high-Q overhang inductors; peak Q-factor; substrate coupling; Air gaps; Copper; Fabrication; Glass; Inductance; Inductors; Q factor; Radio frequency; Silicon; Spirals;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location
Washington, DC, USA
Print_ISBN
0-7803-5410-9
Type
conf
DOI
10.1109/IEDM.1999.824260
Filename
824260
Link To Document