DocumentCode :
1645933
Title :
Analysis and control of hysteresis in PD/SOI CMOS
Author :
Pelella, M.M. ; Fossum, J.G. ; Chiang, M.-H. ; Workman, G.O. ; Tretz, C.R.
Author_Institution :
Florida Univ., Gainesville, FL, USA
fYear :
1999
Firstpage :
831
Lastpage :
834
Abstract :
A new methodology to characterize and analyze hysteresis in PD/SOI CMOS inverter-based circuits, including its true worst case, is defined, and new insight into the underlying physics is provided. The methodology is used to explore novel device/circuit designs for controlling hysteresis as the PD/SOI CMOS technology is scaled to <100 nm.
Keywords :
CMOS logic circuits; hysteresis; logic gates; silicon-on-insulator; 100 nm; hysteresis; partially depleted SOI CMOS inverter circuit; CMOS technology; Charge carrier processes; Delay effects; Hysteresis; Industrial control; MOSFET circuits; Physics; Propagation delay; Ultra large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-5410-9
Type :
conf
DOI :
10.1109/IEDM.1999.824278
Filename :
824278
Link To Document :
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