• DocumentCode
    1646429
  • Title

    Theoretical and experimental comparison of optimized doping profiles for high-performance InP Gunn devices at 220-500 GHz

  • Author

    Kamoua, R. ; Eisele, H.

  • Author_Institution
    Dept. of Electr. Eng., State Univ. of New York, Stony Brook, NY, USA
  • Volume
    2
  • fYear
    2003
  • Firstpage
    907
  • Abstract
    Different types of doping profiles are investigated theoretically and experimentally for their potential of improving the performance of InP Gunn devices at J-band (220-325 GHz) frequencies and above. As initial experimental results, devices with an optimized graded doping profile generated output power levels approximately twice the previous state-of-the-art values at 280-300 GHz. Simulations identified a fiat doping profile with a notch at the cathode as even more promising. For example, an RF output power of 50 mW at 240 GHz is predicted for this profile compared to 42 mW at 240 GHz from an optimized graded doping profile.
  • Keywords
    Gunn devices; III-V semiconductors; doping profiles; indium compounds; 220 to 500 GHz; 42 mW; 50 mW; InP; InP Gunn device; J-band; RF output power; doping profile; Cathodes; Doping profiles; Gallium arsenide; Gunn devices; Heat sinks; Indium phosphide; Oscillators; Power generation; Radio frequency; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 2003 IEEE MTT-S International
  • Conference_Location
    Philadelphia, PA, USA
  • ISSN
    0149-645X
  • Print_ISBN
    0-7803-7695-1
  • Type

    conf

  • DOI
    10.1109/MWSYM.2003.1212516
  • Filename
    1212516