• DocumentCode
    1646938
  • Title

    Kinetics parameters studies of Co-Fe-B deposits using multiple regression

  • Author

    He, Hua Hui ; Liu, Chang Hui ; Shen, Xiang ; Li, Hai Hua

  • Author_Institution
    Dept. of Electron. Sci. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    2
  • fYear
    2005
  • Firstpage
    1480
  • Abstract
    A mathematics model based on multiple linear regression (MLR) for the deposition rate of the electroless Co-Fe-B thin film was established. The plating rate of electroless Co-Fe-B deposits is a function of concentration of sodium tetrahydroborate, pH of the plating bath, plating temperature and the metallic ratio. The correlation of deposition rate and the solution concentration and pH value shown in experimental data was described by residual variance S. The estimated regression coefficient b0-3, confidence interval, residual error r and confidence interval rint were ascertained by computer program. The best kinetics equation of deposition rate was derived. The optimal composition of the plating bath was obtained according to experimental results and reaction kinetics equation. In this paper, all kinds of complexing agent and linear regression analysis ware adopted so as to optimize experimental project. Meanwhile, the optimal composition of the plating solution and operating conditions ware obtained, and Co-Fe-B alloy thin film of good quality was fully produced.
  • Keywords
    boron alloys; cobalt alloys; electroless deposition; electroplating; iron alloys; metallic thin films; pH; regression analysis; CoFeB; MLR; deposition rate correlation; electroless thin film; kinetics parameter; multiple linear regression analysis; pH value; plating bath composition; regression coefficient; Boron alloys; Cobalt; Equations; Iron; Kinetic theory; Linear regression; Magnetic films; Plastic films; Saturation magnetization; Sputtering; Co-Fe-B ternary alloy; Deposition rate; Electroless deposition; Kinetics equation; Multiple regression; computer program;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave, Antenna, Propagation and EMC Technologies for Wireless Communications, 2005. MAPE 2005. IEEE International Symposium on
  • Print_ISBN
    0-7803-9128-4
  • Type

    conf

  • DOI
    10.1109/MAPE.2005.1618205
  • Filename
    1618205