DocumentCode
1647126
Title
Thin film characterization using third harmonic generation microscopy
Author
Rodríguez, C. ; Weber, R. ; Nguyen, D.N. ; Emmert, L.A. ; Patel, D. ; Menoni, C.S. ; Rudolph, W.
Author_Institution
Dept. of Phys. & Astron., Univ. of New Mexico, Albuquerque, NM, USA
fYear
2012
Firstpage
1
Lastpage
2
Abstract
Third harmonic microscopy is applied to determine nonlinear susceptibilities of thin films and image nascent, laser incubated, and laser damaged dielectric coatings with unprecedented contrast. The relative contribution of signals from the film and its surroundings is analyzed.
Keywords
coatings; dielectric thin films; hafnium compounds; nonlinear optical susceptibility; optical films; optical harmonic generation; optical microscopy; image nascent coatings; laser damaged dielectric coatings; laser incubated coatings; nonlinear susceptibilities; thin film characterization; third harmonic generation microscopy; Hafnium compounds; Laser beams; Microscopy; Optical imaging; Optical microscopy; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-4673-1839-6
Type
conf
Filename
6325415
Link To Document