• DocumentCode
    164740
  • Title

    Quantitative analysis of Ag3Sn particle size in Sn3.5Ag solder alloy

  • Author

    Garami, Tamas ; Krammer, Oliver

  • Author_Institution
    Dept. of Electron. Technol., Budapest Univ. of Technol. & Econ., Budapest, Hungary
  • fYear
    2014
  • fDate
    23-26 Oct. 2014
  • Firstpage
    247
  • Lastpage
    251
  • Abstract
    Evaluation of the Ag3Sn intermetallic compounds in the solder joints is a difficult issue; so a new image processing technique is developed to give quantitative, numerical results for the grain structure. During the cooling phase of the soldering method, different grain structures could be generated with different cooling rates. It is worth quantifying the difference. The developed image processing algorithm requires simple cross section images for input. During the preparation of the samples, they should be etched with OPS (Oxide Polishing Suspensions). After increasing the contrast, binarizing and filtering the image, the mathematical calculations regarding the grain structure could be performed. By using our algorithm, we found that the magnitude of Ag3Sn grain size follows exponential distribution, so it can be characterized with the amplitude and the exponent of the fitted exponential curve. At last, these parameters were compared to commonly used quantitative parameters, like the mean intercept length or average area of Ag3Sn particles.
  • Keywords
    cooling; curve fitting; etching; exponential distribution; image processing; polishing; production engineering computing; silver alloys; silver compounds; soldering; solders; specimen preparation; suspensions; tin alloys; Ag3Sn; OPS; cooling phase; etching; exponential distribution; fitted exponential curve; grain size magnitude; grain structure; image processing technique; intermetallic compound; mathematical calculation; oxide polishing suspension; particle size; quantitative analysis; sample preparation; solder alloy; solder joint; Atmospheric measurements; Compounds; Cooling; Intermetallic; Materials; Soldering; cooling rate; image processing; intermetallic compound; optical microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design and Technology in Electronic Packaging (SIITME), 2014 IEEE 20th International Symposium for
  • Conference_Location
    Bucharest
  • Type

    conf

  • DOI
    10.1109/SIITME.2014.6967038
  • Filename
    6967038