DocumentCode :
164740
Title :
Quantitative analysis of Ag3Sn particle size in Sn3.5Ag solder alloy
Author :
Garami, Tamas ; Krammer, Oliver
Author_Institution :
Dept. of Electron. Technol., Budapest Univ. of Technol. & Econ., Budapest, Hungary
fYear :
2014
fDate :
23-26 Oct. 2014
Firstpage :
247
Lastpage :
251
Abstract :
Evaluation of the Ag3Sn intermetallic compounds in the solder joints is a difficult issue; so a new image processing technique is developed to give quantitative, numerical results for the grain structure. During the cooling phase of the soldering method, different grain structures could be generated with different cooling rates. It is worth quantifying the difference. The developed image processing algorithm requires simple cross section images for input. During the preparation of the samples, they should be etched with OPS (Oxide Polishing Suspensions). After increasing the contrast, binarizing and filtering the image, the mathematical calculations regarding the grain structure could be performed. By using our algorithm, we found that the magnitude of Ag3Sn grain size follows exponential distribution, so it can be characterized with the amplitude and the exponent of the fitted exponential curve. At last, these parameters were compared to commonly used quantitative parameters, like the mean intercept length or average area of Ag3Sn particles.
Keywords :
cooling; curve fitting; etching; exponential distribution; image processing; polishing; production engineering computing; silver alloys; silver compounds; soldering; solders; specimen preparation; suspensions; tin alloys; Ag3Sn; OPS; cooling phase; etching; exponential distribution; fitted exponential curve; grain size magnitude; grain structure; image processing technique; intermetallic compound; mathematical calculation; oxide polishing suspension; particle size; quantitative analysis; sample preparation; solder alloy; solder joint; Atmospheric measurements; Compounds; Cooling; Intermetallic; Materials; Soldering; cooling rate; image processing; intermetallic compound; optical microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Technology in Electronic Packaging (SIITME), 2014 IEEE 20th International Symposium for
Conference_Location :
Bucharest
Type :
conf
DOI :
10.1109/SIITME.2014.6967038
Filename :
6967038
Link To Document :
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