DocumentCode :
1648504
Title :
High quality factor and high confinement silicon resonators using etchless process
Author :
Griffith, Austin ; Cardenas, Jaime ; Poitras, Carl B. ; Lipson, Michal
Author_Institution :
Sch. of Appl. & Eng. Phys., Cornell Univ., Ithaca, NY, USA
fYear :
2012
Firstpage :
1
Lastpage :
2
Abstract :
We demonstrate high-Q factor and high confinement silicon ring resonators fabricated by a local oxidation of silicon (LOCOS) process. We achieve an intrinsic quality factor of 525,000 in 410 μm-circumference ring resonator.
Keywords :
Q-factor; elemental semiconductors; optical fabrication; optical resonators; oxidation; silicon; LOCOS process; Si; etchless process; high confinement silicon resonators; intrinsic quality factor; local oxidation; ring resonator; Couplings; Optical ring resonators; Optical waveguides; Oxidation; Q factor; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
Type :
conf
Filename :
6325465
Link To Document :
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