DocumentCode
1648716
Title
Enhancing Yield at 45nm: DFM Solutions from Different Perspectives
fYear
2006
Abstract
Summary form only for tutorial.
Keywords
Chemical technology; Design automation; Design for manufacture; Electronic design automation and methodology; Electronics industry; Integrated circuit technology; Integrated circuit yield; Lithography; Profitability; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer-Aided Design, 2006. ICCAD '06. IEEE/ACM International Conference on
Conference_Location
San Jose, CA
ISSN
1092-3152
Print_ISBN
1-59593-389-1
Type
conf
DOI
10.1109/ICCAD.2006.320044
Filename
4110109
Link To Document