Title :
Enhancing Yield at 45nm: DFM Solutions from Different Perspectives
Abstract :
Summary form only for tutorial.
Keywords :
Chemical technology; Design automation; Design for manufacture; Electronic design automation and methodology; Electronics industry; Integrated circuit technology; Integrated circuit yield; Lithography; Profitability; Semiconductor device manufacture;
Conference_Titel :
Computer-Aided Design, 2006. ICCAD '06. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
1-59593-389-1
DOI :
10.1109/ICCAD.2006.320044
