Title :
The application of surface plasmon polariton effect in photonic integration
Author :
Wenhua Gu ; Li Peng ; Senfeng Lai ; Yanghui Wu
Author_Institution :
Sch. of Electron. & Opt. Eng., Nanjing Univ. of Sci. & Technol., Nanjing, China
Abstract :
Nowadays, there are several approaches that are considered to be promising for the further integration of photonic devices, including photonic crystal waveguides and devices, dielectric devices with high refractive index contrast, and surface plasmon waveguides and devices. Among them, researchers have designed a variety of surface plasmon waveguides and devices based on surface plasmon polariton (SPP) effect, because of its characteristics of near field enhancement, space localization and diffraction limit overcoming. These waveguides and devices can be widely used in many aspects of optical communication. This paper first briefly introduces the characteristics and the excitation mode of SPP. Then we review the popular applications of SPP effect in photonic integrated devices, especially for optical communication applications, such as optical waveguides, lasers, couplers. Some latest research results are included. Finally, we briefly summarize our work on non-metal surface plasmon materials.
Keywords :
dielectric devices; integrated optoelectronics; light diffraction; optical waveguides; photonic crystals; polaritons; refractive index; surface plasmons; SPP; dielectric devices; diffraction limit; excitation mode; near field enhancement; optical communication applications; photonic crystal waveguide; photonic integrated devices; refractive index contrast; space localization; surface plasmon device; surface plasmon polariton effect; surface plasmon waveguide; Films; Metals; Optical surface waves; Optical waveguides; Photonics; Plasmons; Surface waves; Optical communication devices; Photonic integration; Surface plasmon polariton (SPP);
Conference_Titel :
Optical Communications and Networks (ICOCN), 2015 14th International Conference on
Conference_Location :
Nanjing
DOI :
10.1109/ICOCN.2015.7203753