Title :
Resolving fast VTH transients after program/erase of flash memory stacks and their relation to electron and hole defects
Author :
Toledano-Luque, M. ; Degraeve, R. ; Zahid, M.B. ; Kaczer, B. ; Kittl, J. ; Jurczak, M. ; Groeseneken, G. ; Van Houdt, J.
Author_Institution :
Dipt. Fis. Aplic. III, Univ. Complutense de Madrid, Madrid, Spain
Abstract :
A new fast technique is developed to investigate the short term post program and erase discharge of flash memory devices with high-k dielectrics. The procedure is based on fast VTH-evaluation methods developed for NBTI and provides the transient characteristics after 20 ms under program or erase conditions. The post program and erase curves provide useful information on the dielectric properties and are used as a fast screening technique for alternative materials.
Keywords :
electron traps; flash memories; high-k dielectric thin films; hole traps; transients; NBTI; VTH transients; VTH-evaluation methods; dielectric property; electron defects; flash memory devices; flash memory stacks; high-k dielectrics; hole defects; program/erase; transient characteristics; Aluminum oxide; Character generation; Charge carrier processes; Dielectric measurements; Electron traps; Energy states; Flash memory; High K dielectric materials; High-K gate dielectrics; Voltage;
Conference_Titel :
Electron Devices Meeting (IEDM), 2009 IEEE International
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4244-5639-0
Electronic_ISBN :
978-1-4244-5640-6
DOI :
10.1109/IEDM.2009.5424232
