DocumentCode :
1650058
Title :
EDA solutions to new-defect detection in advanced process technologies
Author :
Marinissen, Erik Jan ; Vandling, Gilbert ; Goel, Sandeep Kumar ; Hapke, Friedrich ; Rivers, Jason ; Mittermaier, Nikolaus ; Bahl, Swapnil
Author_Institution :
IMEC, Leuven, Belgium
fYear :
2012
Firstpage :
123
Lastpage :
128
Abstract :
For decades, EDA test generation tools for digital logic have relied on the Stuck-At fault model, despite the fact that process technologies moved forward from TTL (for which the Stuck-At fault model was originally developed) to nanometer-scale CMOS. Under pressure from their customers, especially in quality-sensitive application domains such as automotive, in recent years EDA tools have made great progress in improving their detection capabilities for new defects in advanced process technologies. For this Hot-Topic Session, we invited the three major EDA vendors to present their recent greatest innovations in hiqh-quality automatic test pattern generation, as well as their lead customers to testify of actual production results.
Keywords :
CMOS logic circuits; automatic test pattern generation; fault diagnosis; logic testing; EDA solutions; Stuck-At fault model; advanced process technologies; digital logic; hiqh-quality automatic test pattern generation; nanometer-scale CMOS; new-defect detection; quality-sensitive application domains; underpressure; Automatic test pattern generation; Circuit faults; Delay; Libraries; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2012
Conference_Location :
Dresden
ISSN :
1530-1591
Print_ISBN :
978-1-4577-2145-8
Type :
conf
DOI :
10.1109/DATE.2012.6176444
Filename :
6176444
Link To Document :
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