• DocumentCode
    1650202
  • Title

    Mass transport of aluminum by momentum exchange with conducting electrons

  • Author

    Black, James R.

  • Author_Institution
    Motorola Inc., Phoenix, AZ, USA
  • fYear
    2005
  • Firstpage
    1
  • Lastpage
    6
  • Keywords
    aluminium; electromigration; failure analysis; grain boundary diffusion; integrated circuit reliability; power integrated circuits; power semiconductor devices; self-diffusion; semiconductor device reliability; surface diffusion; 100 degC; Al; activation energy; aluminum mass transport; conducting electron momentum exchange; conductor current density; conductor failure mode; conductor film structure; conductor life; cracked stripe; disappearing aluminum; grain-boundary diffusion; high power IC; high power devices; lattice self-diffusion energy; open circuit; surface diffusion; Aluminum; Conductive films; Conductors; Crystallization; Current density; Electrons; Equations; Integrated circuit reliability; Physics; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International
  • Print_ISBN
    0-7803-8803-8
  • Type

    conf

  • DOI
    10.1109/RELPHY.2005.1493053
  • Filename
    1493053