• DocumentCode
    1650737
  • Title

    Multilayer graphene nanoribbon for 3D stacking of the transistor channel

  • Author

    Ouyang, Yijian ; Dai, Hongjie ; Guo, Jing

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL, USA
  • fYear
    2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The graphene nanoribbon (GNR) transistor suffers from the problem of a low on-current due to the nanometer-wide channel. In this work, a self-consistent atomistic simulation is performed to explore the possibility of boosting the ballistic on-current of the GNRFET by using the experimentally accessible multilayer GNR, which provides a natural structure for 3D stacking of the transistor channel. The effects of the number of graphene layers and interlayer coupling strength are studied under different gating technologies. Only limited improvement of the on-current can be achieved with a typical bottom gate because of the small gate insulator capacitance. With a high-¿ gate, the improvement of the multilayer channel, however, is significant. Reducing the interlayer coupling can further increase the on-current by a factor of 2 for a 5-layer GNR channel.
  • Keywords
    ballistic transport; graphene; insulated gate field effect transistors; multilayers; nanostructured materials; 3D stacking; ballistic on-current; gate insulator capacitance; graphene layer; graphene nanoribbon FET; multilayer graphene nanoribbon; self consistent atomistic simulation; transistor channel; Atomic layer deposition; Boosting; Computational modeling; Insulation; MOSFETs; Nonhomogeneous media; Poisson equations; Quantum capacitance; Stacking; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2009 IEEE International
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-4244-5639-0
  • Electronic_ISBN
    978-1-4244-5640-6
  • Type

    conf

  • DOI
    10.1109/IEDM.2009.5424275
  • Filename
    5424275