DocumentCode :
1650737
Title :
Multilayer graphene nanoribbon for 3D stacking of the transistor channel
Author :
Ouyang, Yijian ; Dai, Hongjie ; Guo, Jing
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL, USA
fYear :
2009
Firstpage :
1
Lastpage :
4
Abstract :
The graphene nanoribbon (GNR) transistor suffers from the problem of a low on-current due to the nanometer-wide channel. In this work, a self-consistent atomistic simulation is performed to explore the possibility of boosting the ballistic on-current of the GNRFET by using the experimentally accessible multilayer GNR, which provides a natural structure for 3D stacking of the transistor channel. The effects of the number of graphene layers and interlayer coupling strength are studied under different gating technologies. Only limited improvement of the on-current can be achieved with a typical bottom gate because of the small gate insulator capacitance. With a high-¿ gate, the improvement of the multilayer channel, however, is significant. Reducing the interlayer coupling can further increase the on-current by a factor of 2 for a 5-layer GNR channel.
Keywords :
ballistic transport; graphene; insulated gate field effect transistors; multilayers; nanostructured materials; 3D stacking; ballistic on-current; gate insulator capacitance; graphene layer; graphene nanoribbon FET; multilayer graphene nanoribbon; self consistent atomistic simulation; transistor channel; Atomic layer deposition; Boosting; Computational modeling; Insulation; MOSFETs; Nonhomogeneous media; Poisson equations; Quantum capacitance; Stacking; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2009 IEEE International
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4244-5639-0
Electronic_ISBN :
978-1-4244-5640-6
Type :
conf
DOI :
10.1109/IEDM.2009.5424275
Filename :
5424275
Link To Document :
بازگشت