• DocumentCode
    1650870
  • Title

    Electron-molecule collisions in semiconductor processing plasmas

  • Author

    McKoy, V. ; Winstead, Chris ; Chuo-Han Lee

  • Author_Institution
    Arthur Amos Noyes Lab. of Chem. Phys., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    1998
  • Firstpage
    269
  • Abstract
    Summary form only given. We will review the progress we have made in exploiting large parallel computers to generate electron collision cross sections for gases of interest to the semiconductor industry. Following an overview of the method employed in these calculations and its computational demands, we will discuss the strategies used to parallelize the compute-intensive steps of these calculations. Results of applications to a few gases used in semiconductor fabrication will then be presented.
  • Keywords
    molecule-electron collisions; physics computing; plasma applications; plasma collision processes; semiconductor technology; compute-intensive steps; electron collision cross sections; electron-molecule collisions; gases; large parallel computers; semiconductor fabrication; semiconductor processing plasmas; Chemical technology; Concurrent computing; Electrons; Fabrication; Gases; Laboratories; Plasma applications; Plasma chemistry; Plasma materials processing; Quantum computing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
  • Conference_Location
    Raleigh, NC, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-4792-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1998.677840
  • Filename
    677840