Title :
Electron-molecule collisions in semiconductor processing plasmas
Author :
McKoy, V. ; Winstead, Chris ; Chuo-Han Lee
Author_Institution :
Arthur Amos Noyes Lab. of Chem. Phys., California Inst. of Technol., Pasadena, CA, USA
Abstract :
Summary form only given. We will review the progress we have made in exploiting large parallel computers to generate electron collision cross sections for gases of interest to the semiconductor industry. Following an overview of the method employed in these calculations and its computational demands, we will discuss the strategies used to parallelize the compute-intensive steps of these calculations. Results of applications to a few gases used in semiconductor fabrication will then be presented.
Keywords :
molecule-electron collisions; physics computing; plasma applications; plasma collision processes; semiconductor technology; compute-intensive steps; electron collision cross sections; electron-molecule collisions; gases; large parallel computers; semiconductor fabrication; semiconductor processing plasmas; Chemical technology; Concurrent computing; Electrons; Fabrication; Gases; Laboratories; Plasma applications; Plasma chemistry; Plasma materials processing; Quantum computing;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677840
