Title :
Fast non-contact flat panel inspection through a dual channel measurement system
Author :
Hamori, Hiroshi ; Sakawa, Masatoshi ; Katagiri, Hideki ; Matsui, Takeshi
Author_Institution :
Grad. Sch. of Eng., Hiroshima Univ., Higashi-Hiroshima, Japan
Abstract :
Research of the inspection and defect repair process for improving the production yield is becoming more important in the flat panel production process which remarkably expands in recent years. In this research, a new non-contact inspection method for the fast and accurate detection of electrical defects subject to repair in a-Si TFT circuits is proposed. The proposed method enables much faster inspection in comparison with the conventional Pin Probe inspection method which has been used for years. In addition, since it can not only detect defects in the target circuit but also specify the location of each defect, a more efficient process management can be realized by having such information in common with the repair system. Further, this non-contact method can eliminate a running cost which has been the most serious problem in the test process by removing the need to replace the pin probing fixtures which vary depending on the circuit type.
Keywords :
electronics industry; flat panel displays; inspection; maintenance engineering; production management; thin film transistors; a-Si TFT circuits; defect repair; dual channel measurement system; noncontact flat panel inspection; panel production process; process management; production yield; Capacitance; Electrodes; Frequency measurement; Inspection; Maintenance engineering; Noise; Voltage measurement; Flat Panel Display; High-Speed Scan; Non-Contact Technology; Open Short Test; Repair;
Conference_Titel :
Computers and Industrial Engineering (CIE), 2010 40th International Conference on
Conference_Location :
Awaji
Print_ISBN :
978-1-4244-7295-6
DOI :
10.1109/ICCIE.2010.5668229