• DocumentCode
    1651265
  • Title

    Silicon photonics technologies for monolithic electronic-photonic integrated circuit (EPIC) applications: Current progress and future outlook

  • Author

    Ang, K.W. ; Liow, T.-Y. ; Fang, Q. ; Yu, M.B. ; Ren, F.F. ; Zhu, S.Y. ; Zhang, J. ; Ng, J.W. ; Song, J.F. ; Xiong, Y.Z. ; Lo, G.Q. ; Kwong, D.L.

  • Author_Institution
    Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
  • fYear
    2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Research into the limits of electrical interconnects indicates that metal wire is unlikely to be the ultimate solution to support the growing functionalities of next generation microprocessor. Severe information latency and power consumption are key technological challenges facing the traditional copper interconnects which impose tremendous constraints to keep up with the performance roadmap known as Moore´s Law. The shift of paradigm in computer architecture that enables significant parallelism based on a radically new communication landscape will be a remarkable breakthrough. Converging electronic and photonic integrated circuits (EPIC) on a single chip platform to enable functional diversification emerges as one promising approach which could be realized by taking the advantage of low energy and huge data capacity of optical interconnects. By leveraging on the wealth of CMOS technology know-how and infrastructures, the fundamental photonics building blocks that are essential for the demonstration of low-cost EPIC platform have been successfully developed in this work. We present an overview on the current status of this critical technology development and provide an outlook for the monolithic integration of Si micro- and nano-photonics. A seamless integration of EPIC is poised to become a promising technology to meet the bandwidth and energy requirements of data communication in future technology nodes.
  • Keywords
    CMOS integrated circuits; integrated optics; monolithic integrated circuits; CMOS technology; Moore´s Law; complementary metal-oxide-semiconductor; computer architecture; copper interconnects; data communication; electrical interconnects; functional diversification; information latency; metal wire; monolithic electronic photonic integrated circuit; monolithic integration; next generation microprocessor; optical interconnects; power consumption; silicon photonics technologies; Application specific integrated circuits; CMOS technology; Delay; Integrated circuit interconnections; Integrated circuit technology; Microprocessors; Monolithic integrated circuits; Photonic integrated circuits; Silicon; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2009 IEEE International
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-4244-5639-0
  • Electronic_ISBN
    978-1-4244-5640-6
  • Type

    conf

  • DOI
    10.1109/IEDM.2009.5424294
  • Filename
    5424294