1651851

Impact of plasma induced damage on PMOSFETs Tin/HF silicate stack

Song, S.C. ; Bae, S.H. ; Zhang, Z. ; Sim, J.H. ; Sassman, B. ; Bersuker, G. ; Zeitzoff, P. ; Lee, B.H.

SEMATECH, Austin, TX, USA

2005

398

402

MOSFET; hafnium compounds; plasma deposition; plasma interactions; titanium compounds; MOSFET; TiN-HfSiO₄; comb antennas; dielectric breakdown; pMOSFET; plasma assisted deposition processes; plasma induced damage; plate antenna structures; titanium nitride/hafnium silicate stack; transient charge trapping; Boron; Degradation; Hafnium; MOSFETs; Plasma applications; Plasma devices; Plasma materials processing; Plasma sources; Shape control; Tin;

English

ieee

Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International

0-7803-8803-8

conf

10.1109/RELPHY.2005.1493119

1493119