DocumentCode :
1653046
Title :
Exponential dependence of percolation resistance on gate voltage and its impacts on progressive breakdown
Author :
Lo, V.L. ; Pey, K.L. ; Tung, C.H. ; Ang, D.S. ; Tang, L.J.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
fYear :
2005
Firstpage :
602
Lastpage :
603
Keywords :
MOSFET; dielectric thin films; percolation; semiconductor device breakdown; MOSFET; catastrophic failure; gate dielectric defect density; localized heating; parasitic resistances; percolation resistance degradation; percolation resistance gate voltage dependence; progressive breakdown hardness; ultrathin gate dielectrics; Breakdown voltage; Degradation; Dielectric breakdown; Dielectric substrates; Electric resistance; Electrical resistance measurement; Leakage current; MOSFETs; Microelectronics; Stress measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International
Print_ISBN :
0-7803-8803-8
Type :
conf
DOI :
10.1109/RELPHY.2005.1493163
Filename :
1493163
Link To Document :
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