DocumentCode :
1653212
Title :
RTS-like fluctuation in Gate Induced Drain Leakage current of Saddle-Fin type DRAM cell transistor
Author :
Kim, Heesang ; Kim, Kyungdo ; Oh, Tae-Kyung ; Cha, Seon-Yong ; Hong, Sung-Joo ; Park, Sung-Wook ; Shin, Hyungcheol
Author_Institution :
Inter-Univ. Semicond. Res. Center (ISRC), Seoul Nat. Univ., Kwanak-gu, South Korea
fYear :
2009
Firstpage :
1
Lastpage :
4
Abstract :
RTS (random telegraph signal)-like fluctuation in Gate Induced Drain Leakage (GIDL) current of Saddle-Fin (S-Fin) type DRAM cell transistor was investigated for the first time. Furthermore, two types of fluctuation which have apparently different ¿high (average time duration of high leakage state) to ¿low (average time duration of low leakage state) ratio were investigated, and it was found that the energy difference between bistable levels is similar to that of the junction leakage.
Keywords :
DRAM chips; leakage currents; transistors; average time duration; bistable levels; gate induced drain leakage current; random telegraph signal-like fluctuation; saddle-fin type DRAM cell transistor; Current measurement; Fluctuations; Frequency domain analysis; Leakage current; Monitoring; Random access memory; Research and development; Telegraphy; Time measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2009 IEEE International
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4244-5639-0
Electronic_ISBN :
978-1-4244-5640-6
Type :
conf
DOI :
10.1109/IEDM.2009.5424370
Filename :
5424370
Link To Document :
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