Title :
RTS-like fluctuation in Gate Induced Drain Leakage current of Saddle-Fin type DRAM cell transistor
Author :
Kim, Heesang ; Kim, Kyungdo ; Oh, Tae-Kyung ; Cha, Seon-Yong ; Hong, Sung-Joo ; Park, Sung-Wook ; Shin, Hyungcheol
Author_Institution :
Inter-Univ. Semicond. Res. Center (ISRC), Seoul Nat. Univ., Kwanak-gu, South Korea
Abstract :
RTS (random telegraph signal)-like fluctuation in Gate Induced Drain Leakage (GIDL) current of Saddle-Fin (S-Fin) type DRAM cell transistor was investigated for the first time. Furthermore, two types of fluctuation which have apparently different ¿high (average time duration of high leakage state) to ¿low (average time duration of low leakage state) ratio were investigated, and it was found that the energy difference between bistable levels is similar to that of the junction leakage.
Keywords :
DRAM chips; leakage currents; transistors; average time duration; bistable levels; gate induced drain leakage current; random telegraph signal-like fluctuation; saddle-fin type DRAM cell transistor; Current measurement; Fluctuations; Frequency domain analysis; Leakage current; Monitoring; Random access memory; Research and development; Telegraphy; Time measurement; Voltage;
Conference_Titel :
Electron Devices Meeting (IEDM), 2009 IEEE International
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4244-5639-0
Electronic_ISBN :
978-1-4244-5640-6
DOI :
10.1109/IEDM.2009.5424370