DocumentCode :
1653230
Title :
Radiofrequency helicon plasmas produced in Ar with concentrations of N/sub 2/ and O/sub 2/*
Author :
Guo, Xuemei ; Scharer, J. ; Gui, Huaimeng ; Mouzouris, Y.
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
fYear :
1998
Firstpage :
275
Abstract :
Summary form only given. We have designed and constructed a radiofrequency helicon plasma source to study Ar and Ar with a mixture of air constituents (N/sub 2/ and O/sub 2/). Experimental measurements of the radial and axial profiles of plasma density, electron temperature, lifetime and wave properties are presented employing Langmuir and B-dot probes. We investigate regimes from lower (1-20 mTorr) to higher gas pressures and the role of wave frequency (2-200 MHz) and magnetic field (200-1000 G) on the wave coupling and plasma profiles. The experimental results will be compared with ANTENA II and MAXEB simulation results which incorporate 1- and 2-D plasma density effects as well as the 2-D coupling antenna. The full electromagnetic and electrostatic character of the helicon wave will be examined. We discuss the dominant chemical and physical processes in air constituents (N/sub 2/, O/sub 2/ and N/sub 2//O/sub 2/) plasmas and examine means to efficiently detach electrons from negative ions and reduce the power budget.
Keywords :
helicons; plasma density; plasma diagnostics; plasma pressure; plasma production; plasma simulation; plasma temperature; 1 to 20 mtorr; 1 to 3 kW; 1-D plasma density effects; 2 to 200 MHz; 2-D plasma density effects; 200 to 1000 G; ANTENA II simulation; Ar; Ar-N/sub 2/-O/sub 2/; Ar-N/sub 2/-O/sub 2/* mixtures; B-dot probes; Langmuir probes; MAXEB simulation; RF helicon plasmas; axial profiles; electromagnetic character; electron detachment; electron temperature; electrostatic character; gas pressures; magnetic field; negative ions; plasma density; plasma lifetime; plasma profiles; power budget; power requirements; radial profiles; radiofrequency helicon plasma source; wave coupling; wave frequency; wave properties; Argon; Electrons; Magnetic field measurement; Plasma chemistry; Plasma density; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677855
Filename :
677855
Link To Document :
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