Title :
76.8 MHz, 105 ppm temperature stable, 106 fs jitter AlN-on-Si MEMS oscillator for cellular applications
Author :
Kourani, Ali ; Hegazi, Emad ; Ismail, Yehea
Author_Institution :
Center for Nano-Electron. & Devices, American Univ. in Cairo & Zewail City for Sci. & Technol., Cairo, Egypt
Abstract :
This paper accounts on the design of a low phase noise 76.8 MHz AlN-on-silicon reference oscillator using SiO2 for passive temperature compensation. The work targets LTE cellular applications. This study demonstrates thorough theoretical optimizations of all the crucial parameters for AlN-on-silicon width extensional mode resonators, filling into the knowledge gap which targets tens of megahertz frequency range for this type of resonators. Series resonance oscillator achieves phase noise of -127 dBc/Hz at 1 kHz, and -161 dBc/Hz at 1MHz offset. The oscillator consumes 850μA using 1.8V supply in 65nm CMOS, with integrated root mean square jitter of 106 fs (10 kHz-20 MHz), figure-of-merit of 216 dB and a startup time of 250μs. The paper presents a platform for high performance MEMS reference oscillators; where, it proves the applicability of replacing bulky quartz with MEMS resonators in wireless handsets, hence reducing cost and area.
Keywords :
CMOS integrated circuits; III-V semiconductors; Long Term Evolution; aluminium compounds; compensation; jitter; micromechanical resonators; phase noise; silicon; silicon compounds; wide band gap semiconductors; AlN; AlN-on-silicon MEMS oscillator; CMOS; LTE cellular application; Long Term Evolution; MEMS resonator; Si; SiO2; complementary metal oxide semiconductor; current 850 muA; extensional mode resonator; figure-of-merit; frequency 10 kHz to 20 MHz; frequency 76.8 MHz; integrated root mean square jitter; low phase noise; megahertz frequency range; microelectromechanical system; passive temperature compensation; reference oscillator; series resonance oscillator; size 65 nm; temperature stability; voltage 1.8 V; wireless handset; Aluminum nitride; III-V semiconductor materials; Micromechanical devices; Phase noise; Resonant frequency; Silicon; MEMS; cellular; phase noise; series resonant oscillator; temperature compensation;
Conference_Titel :
Signals, Circuits and Systems (ISSCS), 2015 International Symposium on
Conference_Location :
Iasi
Print_ISBN :
978-1-4673-7487-3
DOI :
10.1109/ISSCS.2015.7203980