DocumentCode :
1653730
Title :
Fixed origin corner square inspection layout regularity metric
Author :
Pons, Marc ; Morgan, Marc ; Piguet, Christian
Author_Institution :
Electron. Eng., Univ. Politec. de Catalunya, Barcelona, Spain
fYear :
2012
Firstpage :
1397
Lastpage :
1402
Abstract :
Integrated circuits suffer from serious layout printability issues associated to the lithography manufacturing process. Regular layout designs are emerging as alternative solutions to help reducing these systematic subwavelength lithography variations. However, there is no metric to evaluate and compare the layout regularity of those regular designs and there is no methodology to link layout regularity to the reduction of process variations. In this paper we propose a new layout regularity metric called Fixed Origin Corner Square Inspection (FOCSI). We also provide a methodology using the Monte Carlo analysis to evaluate and understand the impact of regularity on process variability.
Keywords :
Monte Carlo methods; integrated circuit layout; integrated circuit manufacture; photolithography; Monte Carlo analysis; fixed origin corner square inspection layout regularity metric; integrated circuits; layout printability; link layout regularity; lithography manufacturing process; process variations reduction; systematic subwavelength lithography variations; Fourier transforms; Generators; Layout; Libraries; Lithography; Measurement; Robustness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2012
Conference_Location :
Dresden
ISSN :
1530-1591
Print_ISBN :
978-1-4577-2145-8
Type :
conf
DOI :
10.1109/DATE.2012.6176581
Filename :
6176581
Link To Document :
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