DocumentCode :
1653927
Title :
Dielectric engineering in nanocrystal memory devices for improved programming dynamics
Author :
Lee, Jong Jin ; Bai, Wciping ; Kwong, Dim-Lee
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
fYear :
2005
Firstpage :
668
Lastpage :
669
Keywords :
dielectric devices; integrated memory circuits; nanostructured materials; random-access storage; Fowler-Nordheim programming regime; Si; control barrier; dielectric engineering; high-k dielectrics; nonvolatile memory; programming dynamics; programming instability; silicon nanocrystal memory device; Dielectric devices; Dynamic programming; Electrons; High K dielectric materials; High-K gate dielectrics; Nanocrystals; Nonvolatile memory; Silicon; Tunneling; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International
Print_ISBN :
0-7803-8803-8
Type :
conf
DOI :
10.1109/RELPHY.2005.1493196
Filename :
1493196
Link To Document :
بازگشت