Title :
GaN monolithic inverter IC using normally-off gate injection transistors with planar isolation on Si substrate
Author :
Uemoto, Yasuhiro ; Morita, Tatsuo ; Ikoshi, Ayanori ; Umeda, Hidekazu ; Matsuo, Hisayoshi ; Shimizu, Jun ; Hikita, Masahiro ; Yanagihara, Manabu ; Ueda, Tetsuzo ; Tanaka, Tsuyoshi ; Ueda, Daisuke
Author_Institution :
Semicond. Device Res. Center, Panasonic Corp., Nagaokakyo, Japan
Abstract :
We present a GaN monolithic inverter IC on Si substrate and successful motor-drive by it for the first time. Taking advantages of the bi-directional operation free from the forward voltage off-set, the inverter can be operated just by the integrated six GaN-based normally-off gate injection transistors (GITs) without any external fast recovery diodes (FRDs) to flow the fly-wheel current. The IC enables the efficiency as high as 93% at low power operation where so far that of conventional Si-based inverters has remained lower value owing to the forward voltage off-set. The key processing technology is the newly introduced planar isolation using Fe ion implantation which fully isolates the GaN-based lateral devices each other.
Keywords :
HEMT integrated circuits; III-V semiconductors; diodes; gallium compounds; insulated gate field effect transistors; invertors; ion implantation; iron; motor drives; silicon; wide band gap semiconductors; GaN:Fe-Si; Si; bidirectional operation; fast recovery diodes; fly-wheel current; forward voltage off-set; ion implantation; low power operation; monolithic inverter IC; normally-off gate injection transistors; planar isolation; silicon substrate; Aluminum gallium nitride; Annealing; Gallium nitride; HEMTs; Inverters; Ion implantation; Iron; MODFETs; Monolithic integrated circuits; Voltage;
Conference_Titel :
Electron Devices Meeting (IEDM), 2009 IEEE International
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4244-5639-0
Electronic_ISBN :
978-1-4244-5640-6
DOI :
10.1109/IEDM.2009.5424397