Title :
Fast WLRC applications in foundry fabrication
Author :
Tseng, Summer ; Chien, W. T Kary ; Wang, Willing ; Zhao, Atman ; Gong, Excimer
Author_Institution :
Reliability Eng. Div., Semicond. Manufactory Int. Corp., Shanghai, China
Keywords :
contact resistance; electromigration; integrated circuit manufacture; integrated circuit reliability; integrated circuit testing; semiconductor device reliability; advanced microelectronic fabrication; double-point gate oxide integrity test; fast I-ramp electromigration test; foundry fabrication; probe contact resistance; reliability test methods; reliability test structures; test accuracy; test effectiveness; test pattern; test stability; wafer level reliability control test; Contact resistance; Control charts; Fabrication; Foundries; Leakage current; Probes; Reliability engineering; Stability; Testing; Voltage;
Conference_Titel :
Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International
Print_ISBN :
0-7803-8803-8
DOI :
10.1109/RELPHY.2005.1493200
