DocumentCode
165448
Title
Evaluation of stress distribution in direct stamping of silver nano ink by analysis of finite-element model
Author
Jiseok Kim ; Woo Soo Kim
Author_Institution
SFU Stretchable Devices Lab., Simon Fraser Univ., Surrey, BC, Canada
fYear
2014
fDate
18-21 Aug. 2014
Firstpage
416
Lastpage
419
Abstract
Mechanical analysis in direct stamping of silver nano ink is simulated by a finite element model, Ansys. Stress distribution on the layer of silver nano ink is predicted while external pressure is applied onto the stamp. Compressive stress over the layer of silver nano ink is approximately the external pressure while higher stress is found at the both side-end of pattern trench. This compressive stress may help to compact silver nano ink in the trench of the stamp to form densified conductive electrode.
Keywords
finite element analysis; ink; metal stamping; nanopatterning; silver; stress analysis; Ansys; compressive stress; densified conductive electrode; external pressure; finite-element model analysis; mechanical analysis; pattern trench; silver nanoink direct stamping; stress distribution evaluation; Ink; Modeling; Nanoparticles; Silver; Strain; Stress; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location
Toronto, ON
Type
conf
DOI
10.1109/NANO.2014.6967970
Filename
6967970
Link To Document