• DocumentCode
    165448
  • Title

    Evaluation of stress distribution in direct stamping of silver nano ink by analysis of finite-element model

  • Author

    Jiseok Kim ; Woo Soo Kim

  • Author_Institution
    SFU Stretchable Devices Lab., Simon Fraser Univ., Surrey, BC, Canada
  • fYear
    2014
  • fDate
    18-21 Aug. 2014
  • Firstpage
    416
  • Lastpage
    419
  • Abstract
    Mechanical analysis in direct stamping of silver nano ink is simulated by a finite element model, Ansys. Stress distribution on the layer of silver nano ink is predicted while external pressure is applied onto the stamp. Compressive stress over the layer of silver nano ink is approximately the external pressure while higher stress is found at the both side-end of pattern trench. This compressive stress may help to compact silver nano ink in the trench of the stamp to form densified conductive electrode.
  • Keywords
    finite element analysis; ink; metal stamping; nanopatterning; silver; stress analysis; Ansys; compressive stress; densified conductive electrode; external pressure; finite-element model analysis; mechanical analysis; pattern trench; silver nanoink direct stamping; stress distribution evaluation; Ink; Modeling; Nanoparticles; Silver; Strain; Stress; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
  • Conference_Location
    Toronto, ON
  • Type

    conf

  • DOI
    10.1109/NANO.2014.6967970
  • Filename
    6967970