DocumentCode
165455
Title
Fabrication of Silicon thin film by metal-assisted chemical etching
Author
Song-Ting Yang ; Chien-Ting Liu ; Thiyagu, Subramani ; Chen-Chih Hsueh ; Ching-Fuh Lin
Author_Institution
Grad. Inst. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear
2014
fDate
18-21 Aug. 2014
Firstpage
799
Lastpage
800
Abstract
We fabricate a Silicon thin film by metal-assisted chemical etching (MacEch). Generally, it is hard to make a large size silicon thin film. Here we demonstrate a low cost and simple method to lift off the silicon thin film from silicon wafer. Besides, the substrate is reusable, so we can fabricate many thin films from the same wafer. Thus, this method is competitive for commercial applications.
Keywords
elemental semiconductors; etching; semiconductor growth; semiconductor thin films; silicon; Si; commercial application; metal-assisted chemical etching; reusable substrate; silicon thin film; silicon wafer; Chemicals; Educational institutions; Electrical engineering; Etching; Photovoltaic cells; Resists; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location
Toronto, ON
Type
conf
DOI
10.1109/NANO.2014.6967974
Filename
6967974
Link To Document