• DocumentCode
    1654839
  • Title

    Device drive current degradation observed with retrograde channel profiles

  • Author

    Venkatesan, S. ; Lutze, J.W. ; Lage, C. ; Taylor, W.J.

  • Author_Institution
    Adv. Products Res. & Dev. Lab., Motorola Inc., Austin, TX, USA
  • fYear
    1995
  • Firstpage
    419
  • Lastpage
    422
  • Abstract
    Super steep retrograde channel profiles have been widely known to produce improved short channel characteristics in sub-0.35 μm CMOS technologies. In this paper, an attempt is made to leverage this improved short channel behaviour and thereby improve transistor performance (as measured by the current drive). Whereas significant improvements in short channel effects measured by DIBL and ΔVtsat are obtained with retrograde channels, it is observed that for a fixed gate length and equal threshold voltage, transistors with retrograde channel profiles typically exhibit lower drive currents than equivalent transistors fabricated with conventional doping profiles. Potential trade offs in device design resulting from this observation are discussed
  • Keywords
    MOSFET; doping profiles; semiconductor doping; 0.35 micron; CMOS transistor; DIBL; device design; doping profile; drive current; short channel characteristics; super steep retrograde channel profile; threshold voltage; Annealing; Degradation; Doping profiles; Indium; Laboratories; Length measurement; MOS devices; Performance evaluation; Research and development; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1995. IEDM '95., International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2700-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1995.499228
  • Filename
    499228