DocumentCode :
1655020
Title :
Oscillation and chaos in a plasma filled diode-Three different computational models
Author :
Lindsay, P.A. ; Chen, X. ; Watkins, J. ; Xiong, C. ; Zhang, J.
Author_Institution :
Dept. of Electron. Eng., King´´s Coll., London, UK
fYear :
1998
Firstpage :
278
Abstract :
Summary form only given. It is well established by now that from the computational point of view the system is by no means simple, the inherent non-linearity of the beam/field interaction process greatly adding to the difficulties. In principle there are three different approaches to the problem of computer modeling of the system: we can either represent the electron beam by a large number of charged sheets and follow their travel through the inter-electrode space using Lagrange formulation to allow for possible overtaking; or we can derive two integral equations of Volterra type in order to obtain the time dependence of the transit time and the electric field at the entrance electrode; or one can use a PIC code, such as MAGIC, in order to obtain a time resolved distribution of electric field and space charge between the electrodes. In our presentation we wish to compare the three methods of simulation emphasizing their advantages and weaknesses. In particular we wish to consider their suitability for tackling the more difficult problem of modeling the system with a resonant load. The problem of mobile ions should also he considered in this context.
Keywords :
chaos; integral equations; plasma diodes; plasma oscillations; plasma simulation; Lagrange formulation; MAGIC; PIC code; Volterra type; beam/field interaction process; chaos; charged sheets; computational models; computer modeling; electric field; electron beam; integral equations; inter-electrode space; oscillation; plasma filled diode; resonant load; space charge; time dependence; time resolved distribution; Chaos; Diodes; Distributed computing; Electrodes; Electron beams; Integral equations; Lagrangian functions; Plasmas; Resonance; Space charge;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677862
Filename :
677862
Link To Document :
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