• DocumentCode
    1655264
  • Title

    The implications of self-consistent current density design guidelines comprehending electromigration and Joule heating for interconnect technology evolution

  • Author

    Hunter, William R.

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    1995
  • Firstpage
    483
  • Lastpage
    486
  • Abstract
    We comprehend both electromigration and Joule heating to study for the first time the self-consistent solutions for the maximum allowed interconnect peak current density jpeak Using worst-case heat losses, we show how these solutions can be used to generate adequately safe current density design guidelines. They indicate that thermal effects will dominate the ability to increase jpeak, rather than EM capability of an interconnect system. Further increases in jpeak will have to come at some future time from technology options which lower the temperature at which the interconnect operates
  • Keywords
    current density; electromigration; integrated circuit design; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; temperature distribution; Joule heating; electromigration; interconnect technology; multilevel metal; self-consistent current density design guidelines; single level self consistent theory; thermal effects; worst-case heat losses; Current density; Electromigration; Equations; Guidelines; Heating; Instruments; Lead; Temperature dependence; Thermal conductivity; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1995. IEDM '95., International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2700-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1995.499243
  • Filename
    499243