DocumentCode
1655264
Title
The implications of self-consistent current density design guidelines comprehending electromigration and Joule heating for interconnect technology evolution
Author
Hunter, William R.
Author_Institution
Texas Instrum. Inc., Dallas, TX, USA
fYear
1995
Firstpage
483
Lastpage
486
Abstract
We comprehend both electromigration and Joule heating to study for the first time the self-consistent solutions for the maximum allowed interconnect peak current density jpeak Using worst-case heat losses, we show how these solutions can be used to generate adequately safe current density design guidelines. They indicate that thermal effects will dominate the ability to increase jpeak, rather than EM capability of an interconnect system. Further increases in jpeak will have to come at some future time from technology options which lower the temperature at which the interconnect operates
Keywords
current density; electromigration; integrated circuit design; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; temperature distribution; Joule heating; electromigration; interconnect technology; multilevel metal; self-consistent current density design guidelines; single level self consistent theory; thermal effects; worst-case heat losses; Current density; Electromigration; Equations; Guidelines; Heating; Instruments; Lead; Temperature dependence; Thermal conductivity; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1995. IEDM '95., International
Conference_Location
Washington, DC
ISSN
0163-1918
Print_ISBN
0-7803-2700-4
Type
conf
DOI
10.1109/IEDM.1995.499243
Filename
499243
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