DocumentCode
1655516
Title
Reference voltages and their stress-induced changes in thin film transistors as determined by charge pumping
Author
Balasinski, A. ; Worley, J. ; Zamanian, M. ; Liou, F.T.
Author_Institution
Adv. Technol. Dev., SGS-Thomson Microelectron., Phoenix, AZ, USA
fYear
1995
Firstpage
529
Lastpage
532
Abstract
Application of Charge Pumping (CP) technique to determine threshold (VT) and flatband (VFB) voltages in Thin Film Transistors (TFTs) is demonstrated. Based on frequency dependent CP measurement, gate voltage dependent surface carrier concentration has been derived which can be used to develop models of TFT operation. Stress-induced shifts of VT and VFB have been investigated using the proposed technique
Keywords
MOSFET; carrier density; thin film transistors; TFT operation; charge pumping; flatband voltages; frequency dependent measurement; gate voltage dependent surface carrier concentration; models; reference voltages; stress-induced changes; stress-induced shifts; thin film transistors; threshold voltage; Annealing; Charge measurement; Charge pumps; Current measurement; Frequency estimation; Frequency measurement; MOSFETs; Pulse measurements; Thin film transistors; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1995. IEDM '95., International
Conference_Location
Washington, DC
ISSN
0163-1918
Print_ISBN
0-7803-2700-4
Type
conf
DOI
10.1109/IEDM.1995.499254
Filename
499254
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