Title :
The development of VLSI in China: past, present and future
Author_Institution :
Fudan Univ., Shanghai, China
Abstract :
In this paper a retrospect on the development of semiconductor integrated circuits is given, followed by a more detailed description of the status of the present development of semiconductor materials. Computer-aided design, processing technology, state of art of VLSI and the microelectronics industry in China are covered. Finally, a brief perspective of the market and future development is given
Keywords :
VLSI; circuit CAD; electronics industry; integrated circuit design; integrated circuit manufacture; integrated circuit technology; technological forecasting; China; VLSI; computer-aided design; future development; microelectronics industry; processing technology; semiconductor integrated circuits; semiconductor materials; CMOS integrated circuits; Crystals; Germanium; Integrated circuit technology; Manufacturing; Production facilities; Random access memory; Semiconductor materials; Silicon; Very large scale integration;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-3062-5
DOI :
10.1109/ICSICT.1995.499258
