DocumentCode
1655589
Title
The development of VLSI in China: past, present and future
Author
Xie, Xide
Author_Institution
Fudan Univ., Shanghai, China
fYear
1995
Firstpage
1
Lastpage
6
Abstract
In this paper a retrospect on the development of semiconductor integrated circuits is given, followed by a more detailed description of the status of the present development of semiconductor materials. Computer-aided design, processing technology, state of art of VLSI and the microelectronics industry in China are covered. Finally, a brief perspective of the market and future development is given
Keywords
VLSI; circuit CAD; electronics industry; integrated circuit design; integrated circuit manufacture; integrated circuit technology; technological forecasting; China; VLSI; computer-aided design; future development; microelectronics industry; processing technology; semiconductor integrated circuits; semiconductor materials; CMOS integrated circuits; Crystals; Germanium; Integrated circuit technology; Manufacturing; Production facilities; Random access memory; Semiconductor materials; Silicon; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-3062-5
Type
conf
DOI
10.1109/ICSICT.1995.499258
Filename
499258
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