• DocumentCode
    1656042
  • Title

    Multi-ion diffusion in silica glass using femtosecond pulsed laser deposition

  • Author

    Jose, G. ; Fernandez, T.T. ; Steenson, P. ; Jha, A.

  • Author_Institution
    Inst. for Mater. Res., Univ. of Leeds, Leeds, UK
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrate simultaneous implantation of Tellurium, Zinc, Sodium and Erbium ions in silica glass via fs-PLD. 1.3μm deep uniform diffusion with Δnmax of 0.169 was produced. Process is explained using existing models with experimental verification.
  • Keywords
    diffusion; erbium; high-speed optical techniques; optical glass; pulsed laser deposition; sodium; tellurium; zinc; femtosecond pulsed laser deposition; multiion diffusion; silica glass; Glass; Ions; Laser ablation; Pulsed laser deposition; Silicon compounds; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6325750