DocumentCode
1656042
Title
Multi-ion diffusion in silica glass using femtosecond pulsed laser deposition
Author
Jose, G. ; Fernandez, T.T. ; Steenson, P. ; Jha, A.
Author_Institution
Inst. for Mater. Res., Univ. of Leeds, Leeds, UK
fYear
2012
Firstpage
1
Lastpage
2
Abstract
We demonstrate simultaneous implantation of Tellurium, Zinc, Sodium and Erbium ions in silica glass via fs-PLD. 1.3μm deep uniform diffusion with Δnmax of 0.169 was produced. Process is explained using existing models with experimental verification.
Keywords
diffusion; erbium; high-speed optical techniques; optical glass; pulsed laser deposition; sodium; tellurium; zinc; femtosecond pulsed laser deposition; multiion diffusion; silica glass; Glass; Ions; Laser ablation; Pulsed laser deposition; Silicon compounds; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-4673-1839-6
Type
conf
Filename
6325750
Link To Document