DocumentCode
1656599
Title
Fabrication of a Tapered Structure by Means of Exposure to Diffracted UV Light
Author
Tanaka, T. ; Nomura, T. ; Funabiki, Y. ; Kitadani, T. ; Idei, K. ; Yamashita, K. ; Noda, D. ; Hattori, T.
Author_Institution
Lab. of Adv. Sci. & Technol. for Ind., Hyogo Univ.
fYear
2006
Firstpage
1
Lastpage
6
Abstract
Demands for personal digital assistants (PDA) call for them to be additionally low profile, lightweight, and low power. To fulfil these demands, it is necessary to develop a backlight unit that features low-power consumption, high brightness, and high efficiency. The light source in a backlight unit has a light guide plate, which is a highly important component. The light guide plate has dots to reflect light. It is known that the smaller the dots and the higher the aspect ratio, the brighter the screen. The result of a simulation revealed that it is possible to improve the brightness of light guide plate by forming the shape of a truncated cone with a taper angle of 68 to 78 degrees. However, using the existing machining technology, it is difficult to form the dots into such a shape. Producing a desired shape, like a tapered shape, in the depthwise direction is difficult even with lithography, although using an elaborate mask pattern, this technique can produce a sophisticated shape on a two-dimensional plane. We have produced a tapered microstructure with a high aspect ratio, devising an innovative method of diffracted light exposure based on a lithography technique making use of UV light source. Furthermore, we controlled the taper angle and fabricated a light guide plate through a mold master, Ni-electroforming, and an injection molding by using UV-LIGA process
Keywords
LIGA; brightness; light sources; liquid crystal displays; micromechanical devices; ultraviolet lithography; Ni-electroforming; UV light source; UV-LIGA process; aspect ratio; diffracted UV light; diffracted light exposure; injection molding; light guide plate; lithography technique; low-power consumption; machining technology; mask pattern; personal digital assistants; tapered microstructure; tapered structure; Brightness; Diffraction; Fabrication; Light sources; Lighting control; Lithography; Machining; Microstructure; Personal digital assistants; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro-NanoMechatronics and Human Science, 2006 International Symposium on
Conference_Location
Nagoya
Print_ISBN
1-4244-0717-6
Electronic_ISBN
1-4244-0718-1
Type
conf
DOI
10.1109/MHS.2006.320297
Filename
4110400
Link To Document