Title :
Fixed Beam Moving Stage electron beam lithography of waveguide coupling device structures
Author :
Sanabia, Jason E. ; Burcham, Kevin E. ; Klingfus, Joseph ; Piaszenski, Guido ; Kahl, Michael ; Jede, Ralf
Author_Institution :
Raith USA, Inc., Ronkonkoma, NY, USA
Abstract :
The Fixed Beam Moving Stage (FBMS) lithography mode is used toward the fabrication of waveguide coupling device structures. Scanning electron microscope metrology is used for the dimensional characterization of the resulting waveguide structures.
Keywords :
electron beam lithography; optical fabrication; optical waveguides; scanning electron microscopy; FBMS lithography; dimensional characterization; fixed beam moving stage electron beam lithography; scanning electron microscopy; waveguide coupling device structures; Couplings; Electron beams; Lithography; Optical device fabrication; Optical resonators; Optical waveguides; Performance evaluation;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
