Design of optical assistance in nano-scale fabrication for the flexible display panels

The low yield of the In₂O₃SnO₂ nanostructures during the production of optoelectronic semiconductor is easily seen. A new design of optical assistance module uses an excimer irradiation of deep ultraviolet ray to assist in micro electroetching process as a nano-scale reuse fabrication for the flexible display panels was developed to effectively remove the defective In₂O₃SnO₂ nanostructures from the surface of the optical PET-diaphragm (PET) of the e-paper and to put the substrate of PET-diaphragm back into the production line again. This study uses 172nm excimer light to promote the removal efficiency for the In₂O₃SnO₂ nanostructures. For executing the etching-process of the reuse fabrication, through the excimer irradiation proposed, the In₂O₃SnO₂ stubborn thin-films were easily broken up from the layer´s compositions to the nano-particles and escaped from the PET substrate quickly and cleanly. The required time is shortened by irradiating with the excimer irradiation before the etching processing In₂O₃SnO₂ layers than that of without the excimer irradiating under the similar processing conditions. It is also proved that the excimer irradiation is absolutely to promote the etching effects for the designed tool to efficiently strip away the In₂O₃SnO₂ nanostructures.