New technology for detection and removal of surface contamination involving particulates or water/organic materials

Author

Hoenig, S.A.

Author_Institution

Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA

fYear

1988

Firstpage

189

Lastpage

201

Abstract

Contamination control in the manufacturing and packaging of quartz oscillators used for frequency control is discussed. As part of the production process it is necessary to detect contaminants that can effect the operation of the device and remove them without damaging the resonator system or any auxiliary assemblies. The application of ultraviolet-light-induced photoemission is investigated for monitoring surface contaminants. Cleaning methods using dry ice snow, dry ice polishing, water/ozone solutions and ultrasonics, and electrodes are discussed. Contamination caused by gloves and personnel protection systems are discussed

Keywords

chemical variables measurement; crystal resonators; electron device manufacture; packaging; photoemission; surface treatment; ultrasonic applications; cleaning; contamination control; dry ice polishing; dry ice snow; electron device manufacture; gloves; packaging; particulates; personnel protection systems; production process; quartz oscillators; resonator; surface contaminants; surface contamination; ultrasonics; ultraviolet-light-induced photoemission; water/organic materials; water/ozone solutions; Assembly systems; Frequency control; Ice; Manufacturing; Monitoring; Oscillators; Packaging; Photoelectricity; Production systems; Surface contamination;

fLanguage

English

Publisher

ieee

Conference_Titel

Frequency Control Symposium, 1988., Proceedings of the 42nd Annual

Conference_Location

Baltimore, MD

Type

conf

DOI

10.1109/FREQ.1988.27601

Filename

27601