Title :
Epitaxial ZnO/4H-SiC heterojunction diodes
Author :
Lee, Jae Sang ; Kim, Sang-Cheol ; Moon, Byung-Moo ; Bahng, Wook ; Sang-Cheol Kim ; Nam-Kyun Kim ; Koo, Sang-Mo
Author_Institution :
Dept. of Electron. Mater. Eng., Kwangwoon Univ., Seoul, South Korea
Abstract :
High quality n-ZnO/p-SiC heterojunction diodes have been fabricated and their photoresponse properties have been investigated. X-ray diffraction (XRD) ¿-2¿ patterns show that highly c-axis oriented ZnO films were epitaxially grown on 4H-SiC. The RMS roughness is observed as low as 2 nm by atomic force microscope (AFM). Current-voltage (I-V) characteristics of the fabricated heterojunction diodes have a good rectifying characteristics, and a leakage current less than 10-9 A at -10 V, with a forward current of ~10-5 A at +10 V. The responsivity is measured for different UV wavelengths. As the intensity of UV wavelength is decreased from 365 nm to 254 nm, the photocurrent increased 1.7Ã10-5 A to 3Ã10-5 A.
Keywords :
II-VI semiconductors; atomic force microscopy; epitaxial growth; leakage currents; p-n heterojunctions; photoconductivity; photoemission; semiconductor diodes; semiconductor epitaxial layers; silicon compounds; zinc compounds; 4H-SiC; UV wavelengths; X-ray diffraction ¿-2¿ patterns; ZnO-SiC; atomic force microscope; c-axis oriented films; current-voltage characteristics; epitaxial growth; epitaxial heterojunction diodes; leakage current; photocurrent; photoresponse property; voltage -10 V to 10 V; wavelength 365 nm to 254 nm; Atomic force microscopy; Atomic layer deposition; Current measurement; Diodes; Heterojunctions; Leakage current; Wavelength measurement; X-ray diffraction; X-ray scattering; Zinc oxide;
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
DOI :
10.1109/INEC.2010.5424596