Optical Properties of Silicon Three-Dimensional Photonic Crystal Fabricated by Self-Aligned Two-Directional Electrochemical Etching Method

We have developed a new fabrication process of three-dimensional photonic crystal (3DPC) structures using the self-aligned two-directional electrochemical etching method. We performed optical measurements to clarify the properties of the fabricated 3DPC structures and observed a decrease in the reflectance. We also observed for silicon nanocrystals deposited on the 3DPC structures that the photoluminescence (PL) intensity was increased and the PL decay time was reduced at the same wavelength centered around 750 mn. These experimental results are attributed to the cavity modes formed at defects in the 3DPC structures.