DocumentCode
1659188
Title
In-mole-fraction of InGaAs insertion layers effects on the structural and optical properties of GaSb quantum dots grown on (100) GaAs substrate
Author
Khoklang, Kamonchanok ; Kiravittaya, Suwit ; Thainoi, Supachok ; Panyakeow, Somsak ; Ratanathammaphan, Somchai
Author_Institution
Dept. of Electr. Eng., Chulalongkorn Univ., Bangkok, Thailand
fYear
2015
Firstpage
1
Lastpage
4
Abstract
GaSb quantum dots (QDs) have been grown by solid-source molecular beam epitaxy on a 4-monolayer (ML) InxGa1-xAs (x = 0.07, 0.15, 0.20 and 0.25) to investigate the effects of In-mole-fraction of InGaAs insertion layers on the structural and optical properties of the GaSb QDs. The density of GaSb QDs grown is approximately 1.2-2.8×109cm-2 on InGaAs insertion layers which depends on the In-mole-fraction. Dot shape and size change substantially. The elongation direction of the base changes from [110] to [1-10] when InGaAs insertion layers are introduced. The uniformity of GaSb QDs improves when the indium content increases. The change in their dot morphology is likely due to the modified strain at different values of indium compositions in InGaAs insertion layers. The effects of In-mole-fraction of InGaAs insertion layer on optical properties of the QDs are studied by photoluminescence (PL). PL results show the blueshift of the emission when the indium content in InGaAs insertion layer increases.
Keywords
III-V semiconductors; elongation; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; monolayers; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; spectral line shift; (100) GaAs substrate; GaAs; GaSb-InxGa1-xAs; blueshift; density; dot morphology; elongation; gallium antimonide quantum dots; in-mole-fraction; indium gallium arsenide insertion layers; modified strain; optical properties; photoluminescence; solid-source molecular beam epitaxy; structural properties; Gallium arsenide; Indium; Indium gallium arsenide; Molecular beam epitaxial growth; Quantum dots; Substrates; Surface morphology; GaAs; GaSb quantum dots; InGaAs insertion layers; Stranski-Krastanov; molecular-beam epitaxy system;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON), 2015 12th International Conference on
Conference_Location
Hua Hin
Type
conf
DOI
10.1109/ECTICon.2015.7206945
Filename
7206945
Link To Document