DocumentCode :
1659440
Title :
The role of excess Si content on the number of Si-nanoclusters/Er ions couplings of Er doped SiOx thin films
Author :
Seo, S.-Y. ; Jambois, O. ; Pellegrino, P. ; Garrido, B. ; Gourbilleau, F. ; Rizk, R.
Author_Institution :
Dept. d´´Electron., Univ. de Barcelona, Barcelona
fYear :
2007
Firstpage :
1
Lastpage :
3
Abstract :
Erbium ions have been used as active ions in optical amplifiers because 1.54 mum luminescence due to 4I13/2 rarr4I15/2 4f transition is sharp and intrinsic almost independently of temperature and host matrix, and also corresponds with standard optical telecommunication window. In order to overcome the small absorption cross-section of Er ions, the Er sensitizer such as Yb3+ ions has been introduced. The paper discusses the role of excess Si content on the number of silicon nanocluster-Er ion coupling of Erbium doped silicon oxide thin films.
Keywords :
erbium; ions; nanostructured materials; optical materials; photoluminescence; silicon compounds; sputtered coatings; thin films; SiOx:Er; ion coupling; optical amplifier; optical telecommunication; silicon nanocluster; thin film; Erbium; Erbium-doped fiber amplifier; Luminescence; Optical amplifiers; Optical films; Optical sensors; Particle beam optics; Semiconductor optical amplifiers; Silicon; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2007 4th IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-0934-1
Type :
conf
DOI :
10.1109/GROUP4.2007.4347682
Filename :
4347682
Link To Document :
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