DocumentCode
1659762
Title
Process-induced strain bandgap reduction in Germanium nanostructures
Author
Velha, Philippe ; Paul, Douglas J. ; Myronov, Maksym ; Leadley, David R.
Author_Institution
Sch. of Eng., Univ. of Glasgow, Glasgow, UK
fYear
2012
Firstpage
1
Lastpage
2
Abstract
We studied the photoluminescence of tensile strained germanium nanostructures. Sub-micron gratings and pillars were fabricated before being coated with strained silicon nitride films. Using different deposition conditions and different sizes of structures the stress in the nanostructures can be controlled. The measured optical properties of the samples show that the direct band-gap is shifted drastically towards higher wavelengths over 1.9 μm. This local control of the stress in germanium nanostructures opens the route for both emitters and photodetectors above 1.6 μm wavelength which are not easily available and also potentially towards a germanium laser.
Keywords
elemental semiconductors; energy gap; germanium; nanostructured materials; photoluminescence; tensile strength; Ge; deposition conditions; optical properties; photodetectors; photoluminescence; pillars; process-induced strain bandgap reduction; strained silicon nitride films; submicron gratings; tensile strained germanium nanostructures; Germanium; Gratings; Nanostructures; Optical device fabrication; Silicon; Strain; Strain measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-4673-1839-6
Type
conf
Filename
6325890
Link To Document