• DocumentCode
    1659762
  • Title

    Process-induced strain bandgap reduction in Germanium nanostructures

  • Author

    Velha, Philippe ; Paul, Douglas J. ; Myronov, Maksym ; Leadley, David R.

  • Author_Institution
    Sch. of Eng., Univ. of Glasgow, Glasgow, UK
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We studied the photoluminescence of tensile strained germanium nanostructures. Sub-micron gratings and pillars were fabricated before being coated with strained silicon nitride films. Using different deposition conditions and different sizes of structures the stress in the nanostructures can be controlled. The measured optical properties of the samples show that the direct band-gap is shifted drastically towards higher wavelengths over 1.9 μm. This local control of the stress in germanium nanostructures opens the route for both emitters and photodetectors above 1.6 μm wavelength which are not easily available and also potentially towards a germanium laser.
  • Keywords
    elemental semiconductors; energy gap; germanium; nanostructured materials; photoluminescence; tensile strength; Ge; deposition conditions; optical properties; photodetectors; photoluminescence; pillars; process-induced strain bandgap reduction; strained silicon nitride films; submicron gratings; tensile strained germanium nanostructures; Germanium; Gratings; Nanostructures; Optical device fabrication; Silicon; Strain; Strain measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6325890