Title :
Fabrication of InP micro-lasers on 200 mm wafers
Author :
Mandorlo, F. ; Romeo, P. Rojo ; Fedeli, J.M. ; Letartre, X. ; Grosse, P. ; Regreny, P.
Author_Institution :
Ecole centrale de Lyon, CNRS, Ecully
Abstract :
By die to wafer bonding of InP heterostructure on 200 mm wafer, microelectronics type fabrication of mu source has been achieved using DUV lithography. LED emission was only obtained due to slanted etching of the cavity.
Keywords :
III-V semiconductors; etching; indium compounds; integrated optics; light sources; microcavity lasers; optical fabrication; semiconductor lasers; ultraviolet lithography; wafer bonding; DUV lithography; InP; LED emission; die bonding; laser cavity; micro-laser fabrication; microelectronics type fabrication; semiconductor heterostructure; size 200 mm; slanted etching; wafer bonding; Biomembranes; Contacts; Electromagnetic waveguides; Fabrication; Indium phosphide; Laser modes; Optical pumping; Optical resonators; Optical waveguides; Waveguide lasers;
Conference_Titel :
Group IV Photonics, 2007 4th IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-0934-1
DOI :
10.1109/GROUP4.2007.4347695
